TīmeklisAn Entegris Dual Pod EUV-1000A-A110 has been used for the qualification. The particle detection for the qualification procedure was executed with the TNO's RapidNano Particle Scanner, qualified for particle sizes down to 50nm (PSL equivalent). It has been shown that the target specification of < 2 particles @ 60nm per 25 cycles has been … Tīmeklis2016. gada 2. maijs · RapidNano: Towards 20nm Particle Detection on EUV Mask Blanks Authors (first, second and last of 4) Jacques van der Donck; Peter Bussink; …

RapidNano: Towards 20nm Particle Detection on EUV Mask Blanks

Tīmeklisrapido: [noun] an express train of Italy, Spain, or Latin America. TīmeklisOver the last decade, the smallest detectable particle size was decreased while the inspection rate was increased. This effort has led to a stable and affordable detection platform that is capable of inspecting the full surface of a mask blank.The core of RapidNano is a dark-field imaging technique. team umizoomi sohu 4

A multistep approach for reticle cleaning - DeepDyve

TīmeklisTNO has developed the Rapid Nano scanner to detect nanoparticles on EUVL mask blanks. This scanner was designed to be used in particle qualifications of EUV reticle handling equipment. In this paper we present an end-to-end model of the Rapid Nano detection process. All important design parameters concerning illumination, detection … TīmeklisThe core of RapidNano is a dark-field imaging technique. Every substrate type has a typical background characteristic, which strongly affects the size of the smallest … Tīmeklis2014. gada 1. janv. · A multi-azimuth illumination has been successfully integrated on the Rapid Nano particle scanner. This illumination method reduces the variance of the background scattering on substrate roughness. It allows for a lower setting of the detection threshold, resulting in a more sensitive inspection system. By implementing … team umizoomi sohu s3